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A sputtering target containing zinc oxide, and method of manufacturing 发明授权

2023-07-08 2090 32K 0

专利信息

申请日期 2026-04-22 申请号 JP11183596
公开(公告)号 JP4577924B2 公开(公告)日 2010-11-10
公开国别 JP 申请人省市代码 全国
申请人 Mitsui Mining amp; Smelting Co Ltd6183
简介 PROBLEM TO BE SOLVED : To impart high density and to suppress the unevenness in color by adding a color unevenness preventive to raw material powder, compacting this powdery raw material mixture contg. zinc oxide and executing sintering. SOLUTION : As the color unevenness preventive, a compd. of rare earth oxide which can take a plurality of oxide forms and also has a crystal structure of a lanthaum oxide belonging to a hexagonal system is preferable, and cerium oxide is suitable. It is added by 0.01 to 5.0 wt.% to the total weight of the raw material powder contg. zinc oxide. As the raw material powder, the one contg. 0.1 to 40 wt.% zinc oxide and 0.01 to 5.0 wt.% color unevenness preventive, and the balance indium oxide is preferable. A compacting assistant such as polyvinyl alcohol is added to the powdery raw material mixture, which is compacted by press molding or the like, is dried and degreased, is thereafter sintered desirably at 1, 200 to 1, 600 deg.C at a temp. rising rate of >=200 deg.C/hr and is, if required, subjected to machining such as facing by surface grinding to obtain a sputtering target.


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