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METHOD FOR MANUFACTURING SUBSTRATE WITH FUNCTIONAL FILM 发明申请

2023-12-12 5120 287K 0

专利信息

申请日期 2025-07-22 申请号 JP2009100219
公开(公告)号 JP2010248580A 公开(公告)日 2010-11-04
公开国别 JP 申请人省市代码 全国
申请人 NIDEK KK
简介 PROBLEM TO BE SOLVED : To provide a method for manufacturing a substrate with a functional film capable of enhancing impact resistance with a simple method while having a desired optical function. SOLUTION : In the method for manufacturing the substrate with the functional film by which an optical thin film is formed by vapor deposition of a metal oxide on a substrate made of a transparent resin under a nearly vacuum atmosphere using a physical vapor deposition method, when the metal oxide is deposited on the substrate, excess at least one of a gas selected from any of oxygen, nitrogen and a rare gas is introduced in the range of 1.0×10-2 to 9.0×10-1 Pa to perform vapor deposition. COPYRIGHT : (C)2011, JPO&INPIT


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