| 申请日期 | 2025-06-26 | 申请号 | JP2006505949 |
| 公开（公告）号 | JP4575362B2 | 公开（公告）日 | 2010-11-04 |
| 公开国别 | JP | 申请人省市代码 | 全国 |
| 申请人 | Sigma Aldrich Co | ||
| 简介 | Rare earth metal precursors, for use in MOCVD techniques have a ligand of the general formula OCR1(R2)CH2X, wherein R1 is H or an alkyl group, R2 is an optionally substituted alkyl group and X is selected from OR and NR2, wherein R is an alkyl group or a substituted alkyl group. Methods of making such precursors and methods of depositing metal oxide layers from such precursors are also described. | ||
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