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A vapor-deposited film forming device 发明授权

2023-09-12 3310 158K 0

专利信息

申请日期 2025-09-02 申请号 JP2001065644
公开(公告)号 JP4560971B2 公开(公告)日 2010-10-13
公开国别 JP 申请人省市代码 全国
申请人 Hitachi Metals Ltd5083
简介 PROBLEM TO BE SOLVED : To provide a vapor-deposited film producing apparatus which prevents defects or the formation of projections of a deposited film made of aluminum, etc., on a surface of a rare earth metal permanent magnet and produces the deposited film having a high quality such as corrosion resistance at low cost. SOLUTION : In this vapor-deposited film producing apparatus of the first embodiment, a cylindrical barrel is supported in a revolving manner outwardly in the circumferential direction of the axis of rotation of a supporting member rotatable around the axis of rotation in the horizontal direction, and the distance between the cylindrical barrel revolving around the axis of rotation of the supporting member and an evaporation part is variable by rotating the supporting member. In this vapor-deposited film producing apparatus of the second embodiment, the inside of the cylindrical barrel is split, and at least two storage parts are formed so that the distance between the storage parts and the evaporation part is variable by rotating the cylindrical barrel.


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