| 申请日期 | 2025-06-25 | 申请号 | US11341531 |
| 公开（公告）号 | US7803238B2 | 公开（公告）日 | 2010-09-28 |
| 公开国别 | US | 申请人省市代码 | 全国 |
| 申请人 | Toshihiro Kugimiya; Katsutoshi Takagi; Hitoshi Matsuzaki; Kotaro Kitashita; Yoichiro Yoneda | ||
| 简介 | An Al-base alloy sputtering target consisting Ni and one or more rare earth elements, wherein there are 5.0×104/mm2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2 μm or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher. | ||
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