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The method of manufacturing the magneto-resistive element 发明授权

2023-08-27 4190 130K 0

专利信息

申请日期 2025-06-27 申请号 JP2005306975
公开(公告)号 JP4550713B2 公开(公告)日 2010-09-22
公开国别 JP 申请人省市代码 全国
申请人 Toshiba3078
简介 There is provided a method for manufacturing a magnetoresistive element having a magnetization pinned layer, a magnetization free layer, and a spacer layer including an insulating layer arranged between the magnetization pinned layer and the magnetization free layer and current paths passing through the insulating layer. The method includes, in producing the spacer layer, depositing a first non-magnetic metal layer forming the current paths, depositing a second metal layer to be converted into the insulating layer on the first non-magnetic metal layer, and performing two stages of oxidation treatments in which a partial pressure of an oxidizing gas in a first oxidation treatment is set to 1/10 or less of a partial pressure of an oxidizing gas in a second oxidation treatment, and the second metal layer being irradiated with an ion beam or a RF plasma of a rare gas in the first oxidation treatment.


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