| 简介 |
PROBLEM TO BE SOLVED : To provide a technology for manufacturing a stoichiometric rare-earth oxide film which is an ultra-smooth oxide film completely to the membrane deep part, has a uniform particle diameter and is capable of coating the surface of a target substrate with low damage.SOLUTION : By providing a process for generating an atomic oxygen beam by an atomic beam irradiation means in a first reaction chamber held at a first degree of vacuum and generating a rare-earth metal in the shape of a beam by an arc plasma generating means and depositing it on a target in a second reaction chamber held at a second degree of vacuum and a process for simultaneously making the atomic oxygen beam from the first reaction chamber through an orifice passage irradiate the target in the second reaction chamber, a rare-earth oxide film which has smoothness for producing interference of light and is stoichiometric to the whole of membranous thickness direction is formed on the surface of the target.COPYRIGHT : (C)2010, JPO&INPIT |
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