客服热线:18202992950

PRODUCTION METHOD OF SINGLE CRYSTAL ALUMINUM NITRIDE PLATE BODY 发明申请

2023-06-23 2720 353K 0

专利信息

申请日期 2025-06-29 申请号 JP2009042623
公开(公告)号 JP2010195632A 公开(公告)日 2010-09-09
公开国别 JP 申请人省市代码 全国
申请人 UNIV MEIJO; TOKUYAMA CORP
简介 PROBLEM TO BE SOLVED : To provide a production method, by which a single crystal aluminum nitride plate body having a large area and thickness is formed at high speed. SOLUTION : The method includes : a preparation step of preparing a raw material comprising aluminum nitride and a compound oxide or a compound nitride oxide containing aluminum and at least one kind of element selected from rare earth elements and alkaline earth metal elements, or a raw material comprising aluminum nitride and a raw material substance (except for aluminum nitride) of a compound oxide or a compound nitride oxide, and disposing an inorganic single crystal substrate 22 having projections 24, 26 formed thereon close to the raw material; and a single crystal aluminum nitride forming step of forming a plate body 28 composed of single crystal aluminum nitride on the projections 24, 26 by heating the raw material and the inorganic single crystal substrate 22 in a non-oxidative atmosphere at 10 to 10, 000 Pa while controlling the temperature of the raw material to 1, 600 to 2, 000°C and the temperature of the inorganic single crystal substrate 22 to 1, 580°C or higher but lower than the temperature of the raw material. COPYRIGHT : (C)2010, JPO&INPIT


您还没有登录,请登录后查看下载地址


反对 0举报 0 收藏 0 打赏 0评论 0
下载排行
网站首页  |  关于我们  |  联系方式  |  使用协议  |  版权隐私  |  网站地图  |  排名推广  |  广告服务  |  积分换礼  |  网站留言  |  RSS订阅  |  违规举报  |  京ICP备2021025988号-4