| 申请日期 | 2025-11-25 | 申请号 | JP2004327795 |
| 公开（公告）号 | JP4519610B2 | 公开（公告）日 | 2010-08-04 |
| 公开国别 | JP | 申请人省市代码 | 全国 |
| 申请人 | Sumitomo Osaka Cement Co Ltd183266 | ||
| 简介 | PROBLEM TO BE SOLVED : To provide a coating solution for a protective film formation capable of forming a protecting film for a dielectric layer of a plasma display panel (PDP) being precise without a micro crack or a pinhole and having good sputtering resistance. ŽSOLUTION : The coating solution for the protective film formation contains alkaline-earth metal oxide fine particles and an amine rare earth complex. ŽCOPYRIGHT : (C)2006, JPO&NCIPI Ž | ||
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