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PRODUCTION METHOD OF SINGLE CRYSTAL ALUMINUM NITRIDE PLANAR BODY 发明申请

2023-10-28 4590 184K 0

专利信息

申请日期 2025-06-27 申请号 JP2008314451
公开(公告)号 JP2010138012A 公开(公告)日 2010-06-24
公开国别 JP 申请人省市代码 全国
申请人 UNIV MEIJO; TOKUYAMA CORP
简介 PROBLEM TO BE SOLVED : To provide a method for producing a single crystal aluminum nitride large in diameter and thick in thickness. SOLUTION : The method includes steps of : [A] placing an inorganic single crystal substrate close to a raw material containing aluminum nitride and a compound oxide or a compound oxynitride containing aluminum and at least one kind of element selected from rare earth and alkaline earth metal elements, or a raw material containing aluminum nitride and raw material substances of the above compound oxide or compound oxide nitride (excluding aluminum nitride); [B] controlling the raw material temperature to 1, 600 to 2, 000°C in a nonoxidative gas atmosphere at not lower than 0.9×105 Pa, as well as controlling the temperature of the inorganic single crystal substrate to be ≥1, 580°C and lower than the temperature of the raw material; and [C] forming single crystal aluminum nitride on the inorganic single crystal substrate while keeping the raw material temperature at 1, 600 to 2, 000°C in a non-oxidative gas atmosphere of not lower than 0.9×105 Pa as well as keeping the temperature of the inorganic single crystal substrate to be equal to or higher than 1, 580°C and lower than the temperature of the raw material. COPYRIGHT : (C)2010, JPO&INPIT


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