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OXIDE SEMICONDUCTOR AND MANUFACTURING METHOD THEREFOR 发明申请

2023-06-23 1690 94K 0

专利信息

申请日期 2025-06-29 申请号 JP2008276731
公开(公告)号 JP2010106291A 公开(公告)日 2010-05-13
公开国别 JP 申请人省市代码 全国
申请人 IDEMITSU KOSAN CO
简介 PROBLEM TO BE SOLVED : To provide an oxide semiconductor which shows clear p-type conduction. SOLUTION : A method for manufacturing the oxide semiconductor includes : preparing an indium oxide in which one or more elements selected from alkali metals, alkaline earth metals, rare earth elements, transition metals and nitrogen, or a compound containing one or more of these elements are dissolved and substitute for indium; and heating the indium oxide at a temperature-raising rate of 0.0001-0.1°C/s in a range of 100-250°C to crystallize the indium oxide. COPYRIGHT : (C)2010, JPO&INPIT


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