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SPUTTERING TARGET FOR OPTICAL MEDIUM, METHOD OF MANUFACTURING THE SAME, AND OPTICAL MEDIUM AND MET 发明申请

2023-08-02 1850 172K 0

专利信息

申请日期 2025-07-08 申请号 JP2009133409
公开(公告)号 JP2010097682A 公开(公告)日 2010-04-30
公开国别 JP 申请人省市代码 全国
申请人 TDK CORP
简介 PROBLEM TO BE SOLVED : To provide a sputtering target for optical media which includes relatively inexpensive aluminum as a principle component, in which no rare earth metal is used, and which is excellent in surface smoothness, a method of manufacturing the same, and an optical medium and a method of manufacturing the same. SOLUTION : The sputtering target for the optical media includes Al as a principal component includes 1-10 atom% of one or two elements selected from the group including Ta and Nb and 0.1-10 atom% of Ag. The optical medium 100 includes : a substrate 10; and reflective layers 20A, 20B provided on the substrate 10, and each having a composition including Al as a principal component, 1-10 atom% of one or two types of elements selected from the group including Ta and Nb, and 0.1-10 atom% of Ag. COPYRIGHT : (C)2010, JPO&INPIT


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