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MEMORY ELEMENT, METHOD FOR MANUFACTURING THE MEMORY ELEMENT, AND MEMORY DEVICE COMPRISING MEMORY E 发明申请

2023-08-19 4580 851K 0

专利信息

申请日期 2025-07-15 申请号 WOJP09067047
公开(公告)号 WO2010038786A1 公开(公告)日 2010-04-08
公开国别 WO 申请人省市代码 全国
申请人 NATIONAL UNIVERSITY CORPORATION OKAYAMA UNIVERSITY; IKEDA Naoshi; KUBOZONO Yoshihiro; KAMBE Takashi
简介 Disclosed is a memory element having low-power consumption.  Also disclosed are a method for manufacturing the memory element and a memory device comprising the memory element. The memory element comprises a resistor that causes a change in electric resistance upon the application of voltage and a voltage applying electrode for applying a predetermined voltage to the resistor.  The memory device comprises the memory element.  The resistor is formed of a compound having a layered triangle lattice structure containing a rare earth element.  In particular, the resistor is formed of a compound having a layered triangle lattice structure represented by (RMbO3-δ)n(MaO)m wherein R represents at least one element selected from In, Sc, Y, Dy, Ho, Er, Tm, Yb, Lu, Ti, Ca, Sr, Ce, Sn, and Hf; Ma and Mb, which may be same or different, represent at least one element selected from Ti, Mn, Fe, Co, Cu, Ga, Zn, Al, Mg, and Cd; n is an integer of 1 or more; m is an integer of 0 or more; and δ is a real number of 0 to 0.2.  Alternatively, the resistor may be formed of a compound that is the same compound as described above except that a part of R in the compound has been replaced with a positive divalent or lower element.


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