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Method of regenerating device for plasma processing, the plasma processing device and method for re 发明授权

2023-04-10 2060 120K 0

专利信息

申请日期 2026-04-23 申请号 JP2002550132
公开(公告)号 JP4440541B2 公开(公告)日 2010-03-24
公开国别 JP 申请人省市代码 全国
申请人 Tokyo Electron Limited219967
简介 A method for regenerating a container for plasma treatment, characterized in that, to a thermally sprayed coating comprising one of alumina, a rare earth metal oxide, a polyimide and polybenzimidazole, which has been deteriorated by the use in plasma, on the surface of a member inside a container for plasma treatment having a substrate and, applied thereon, the thermally sprayed coating, a material being the same as that for the deteriorated sprayed coating is re-sprayed. The method allows a container for plasma treatment having a surface deteriorated by the use in plasma to be generated into the one as good as new.


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