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The protective film vapor deposition material for FPD and its manufacturing method 发明授权

2023-07-27 3430 163K 0

专利信息

申请日期 2025-06-27 申请号 JP2001163910
公开(公告)号 JP4419343B2 公开(公告)日 2010-02-24
公开国别 JP 申请人省市代码 全国
申请人 Mitsubishi Materials Corp6264
简介 PROBLEM TO BE SOLVED : To provide an evaporation material which can shorten a discharge treatment time for degassing just after arranging the evaporation material inside of a vacuum film forming vessel, and form a uniform film with stable characteristics. SOLUTION : The evaporation material for the protective coating of FPD(Flat Panel Display) is made of a polycrystalline body 11, a sintered compact, or a single crystalline body, of which the face is covered with a fluoride layer 12. The polycrystalline body 11, the sintered compact or the single crystalline body is made from either of MgO, CaO, SrO, BaO, complex oxide of alkaline earth, oxide of rare earths, or complex oxide of alkaline earth oxide and rare earths oxide. The fluoride layer 12 is formed by reaction of gaseous fluorinating agent with either of MgO, CaO, SrO, BaO, complex oxide of alkaline earth, oxide of rare earths, or complex oxide of alkaline earth oxide and rare earths oxide.


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