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Semiconductor device 发明授权

2023-07-30 2380 132K 0

专利信息

申请日期 2025-07-18 申请号 JP2000013275
公开(公告)号 JP4410894B2 公开(公告)日 2010-02-03
公开国别 JP 申请人省市代码 全国
申请人 Fujitsu Microelectronics308014341
简介 PROBLEM TO BE SOLVED : To obtain a semiconductor device exhibiting excellent compatibility with the structure of conventional Si-MOS transistor and applicable to optical interconnect in which high emission efficiency can be attained easily and surely. SOLUTION : An MIS type light emitting element is constituted similarly to an MIS type (MOS type) transistor. A gate insulation film 3 is formed by adding a light emitting substance, e.g. a semiconductor nanocrystal of Si, SiGe or Ge, polycrystal or microcrystal of a direct transition semiconductor, a rare earth element of Er or Eu, or a fluorescent substance of ZnS : Mn, or the like. Light is emitted from the gate insulation film 3 by applying a specified voltage to the source/drain 2 and a specified bias to the gate electrode 4.


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