| 申请日期 | 2026-03-15 | 申请号 | TW098118837 |
| 公开（公告）号 | TW201002855A | 公开（公告）日 | 2010-01-16 |
| 公开国别 | TW | 申请人省市代码 | 全国 |
| 申请人 | 液态空气乔治斯克劳帝方法研究开发股份有限公司 | ||
| 简介 | Methods and compositions for depositing rare earth metal-containing layers are described herein. In general, the disclosed methods deposit the precursor compounds comprising rare earth-containing compounds using deposition methods such as chemical vapor deposition or atomic layer deposition. The disclosed precursor compounds include a cyclopentadienyl ligand having at least one aliphatic group as a substituent and an amidine ligand. | ||
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