| 简介 |
PROBLEM TO BE SOLVED : To provide a conductive aluminum thin film which is capable of suppressing deposition cost to a low level, is easy in thin film formation, and is wide in a settable range of light reflectivity.
SOLUTION : The oxygen introduced Al thin film 12a which is a conductive Al thin film formed on the surface of a base material 11 is formed by introducing oxygen exceeding solubility limit of Al therein, and the amount of the oxygen introduced into the aluminum of 100at% is 5 to 80at% in the value measured by EPMA. The oxygen introduced Al thin film 12a is deposited by using a physical vapor deposition method utilizing glow discharge using a pure Al target, and controlling an oxygen flow rate with respect to a rare gas flow rate in its deposition atmosphere.
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