| 简介 |
PROBLEM TO BE SOLVED : To provide a neutral particle irradiation type CVD apparatus capable of suppressing gas dissociation due to high-energy electrons or UV light and forming an excellent film having a planned molecular structure.
SOLUTION : A neutral particle beam generating means 11 excites a rare gas to generate plasma, imparts an electric field to the charged particles in the plasma to impart a predetermined energy, and neutralizes the charged particles to generate a neutral particle beam NB. A reaction chamber 10 is configured such that a material gas is introduced, part of the material gas is dissociated by the neutral particle beam under control of energy generated by a neutral particle generating means and polymerized, and a film is deposited on a substrate 14.
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