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METHOD OF STORING TETRACHLOROSILANE AND METHOD OF PRODUCING SILICON 发明申请

2023-07-06 3280 65K 0

专利信息

申请日期 2026-04-20 申请号 JP2008117278
公开(公告)号 JP2009263186A 公开(公告)日 2009-11-12
公开国别 JP 申请人省市代码 全国
申请人 SUMITOMO CHEMICAL CO
简介 PROBLEM TO BE SOLVED : To provide a method of storing a tetrachlorosilane which is used for efficiently producing high purity silicon from tetrachlorosilane and to provide a method of producing silicon using tetrachlorosilane stored by the method as a raw material. SOLUTION : In the method of storing tetrachlorosilane, a vapor phase part of a container 21 for storing liquefied tetrachlorosilane contains a rare gas selected from among argon, helium, neon and a gaseous mixture thereof. In the storage of the liquefied tetrachlorosilane, the nitrification of silicon or the like in the reaction of producing silicon from tetrachlorosilane is prevented by using argon, helium, neon or the gaseous mixture thereof in place of gaseous nitrogen conventionally used as a seal gas. COPYRIGHT : (C)2010, JPO&INPIT


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