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SUBSTRATE WITH TRANSPARENT CONDUCTIVE FILM AND ITS MANUFACTURING METHOD 发明申请

2023-04-06 2190 53K 0

专利信息

申请日期 2025-08-04 申请号 JP2008079921
公开(公告)号 JP2009238416A 公开(公告)日 2009-10-15
公开国别 JP 申请人省市代码 全国
申请人 TOPPAN PRINTING CO LTD
简介 PROBLEM TO BE SOLVED : To provide a substrate with a transparent conductive film in which a used amount of indium which is a rare metal can be reduced, and furthermore, high electric conductivity and sufficient chemical resistance are realized, and its manufacturing method. SOLUTION : This is the substrate with the transparent conductive film which is equipped with the transparent conductive film at least on one face of the substrate, and in which the transparent conductive film is equipped with a first thin film layer composed of zinc oxide and a second thin film layer composed of indium oxide containing tin sequentially from the substrate side. Moreover, this is the manufacturing method of the substrate with the transparent film which is equipped with a process of forming the first thin film layer composed of zinc oxide on the substrate by a magnetron sputtering method, and a process of forming the second thin film layer composed of indium oxide containing tin on the first thin film layer sequentially by a magnetron sputtering method. COPYRIGHT : (C)2010, JPO&INPIT


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