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SILICON NITRIDE SUBSTRATE, METHOD FOR PRODUCING THE SAME, SILICON NITRIDE CIRCUIT BOARD USING THE 发明申请

2023-12-16 5030 154K 0

专利信息

申请日期 2025-06-28 申请号 JP2008063426
公开(公告)号 JP2009215142A 公开(公告)日 2009-09-24
公开国别 JP 申请人省市代码 全国
申请人 HITACHI METALS LTD
简介 PROBLEM TO BE SOLVED : To provide a silicon nitride substrate having high strength, and in which warpage is properly regulated, to provide a method for producing the same, to provide a silicon nitride circuit board using the same, and to provide a semiconductor module. SOLUTION : Silicon nitride raw material powder is blended with magnesium oxide of 3 to 4 wt.% and the oxide of at least one kind of rare earth element of 2 to 5 wt.% in such a manner that the total is controlled to 5 to 8 wt.%, so as to be a sheet molded body, and sintering is performed thereto. Thereafter, in a superimposed state, a plurality of the sintered compacts are heated at 1, 550 to 1, 700°C while applying a load of 0.5 to 6.0 kPa thereto, so as to produce a silicon nitride substrate comprising β type silicon nitride, yttrium (Y) and magnesium (Mg), and in which a variation coefficient showing the distribution of the Mg content in the surface is ≤0.20 and warpage is ≤2.0 μm/mm. COPYRIGHT : (C)2009, JPO&INPIT


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