| 简介 |
Provided are a plasma CVD apparatus and a plasma CVD method, which are enabled to coat the surfaces of fine particles efficiently with a thin film or super-fine particles by concentrating a plasma near the fine particles. The plasma CVD apparatus is characterized by comprising a chamber (13), a container arranged in the chamber for containing fine particles (1) and having a polygonal inner shape in a section generally parallel to the direction of the force of gravity, an earth shielding member (27) for shielding that surface of the container, which is other than the housing face for housing the fine particles (1), a rotating mechanism for causing the container to rotate or act as a pendulum on the axis of rotation substantially perpendicular to the section, an opposed electrode (21) so arranged in the container as to confront the housing face, a plasma power source (23) electrically connected with the container, a gas introducing mechanism for introducing a raw gas into the container, and an evacuation mechanism for evacuating the inside of the chamber. |
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