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Method and System for Exhaust Gases Recovery of Semiconductor Device Fabricating Equipment 发明申请

2023-10-08 3950 324K 0

专利信息

申请日期 2025-08-16 申请号 KR1020080006740
公开(公告)号 KR1020090080778A 公开(公告)日 2009-07-27
公开国别 KR 申请人省市代码 全国
申请人 CHO KEON HWAN
简介 PURPOSE : A method and a system for recovering a waste gas of a semiconductor manufacturing facility are provided to maximally recover a waste gas generated in a process for vacuum-pumping an inert sub gas through a change of a process and configuration.CONSTITUTION : A system for recovering a waste gas of a semiconductor manufacturing facility includes cooling gas supply parts(16, 17, 18, 19), pumping parts(12, 20), replacement gas supply parts(31~35), compression parts(43~47), and a control part. The cooling gas supply parts are connected to a loadlock chamber(2). The cooling gas supply parts supply a rare cooling gas to the loadlock chamber. The pumping parts are connected to the loadlock chamber. The pumping parts pump the rare cooling gas inside the loadlock chamber. The replacement gas supply parts are connected to the loadlock chamber. The replacement gas supply parts supply a replacement gas to the loadlock chamber. The compression parts are connected to the pumping parts. The compression parts compress a rare gas transferred from the pumping parts. The control part is connected to the cooling gas supply parts, the pumping parts, the replacement gas supply parts, and the compression parts. The control part performs a control about operations of each part.© KIPO 2009


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