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REACTION DEVICE AND ELECTRONIC APPARATUS 发明申请

2023-05-08 2810 290K 0

专利信息

申请日期 2025-08-19 申请号 JP2006233849
公开(公告)号 JP2008056521A 公开(公告)日 2008-03-13
公开国别 JP 申请人省市代码 全国
申请人 CASIO COMPUTER CO LTD
简介 PROBLEM TO BE SOLVED : To provide a reaction device which can easily be crystallized, can prevent the cracks and the peel-off of an insulation film which are easy to occur when a metal substrate is distorted in a high temperature environment and can increase the reliability of electrical insulation between the metal substrate and a thin film heater, and to provide an electronic apparatus. SOLUTION : A micro-reactor 1, which causes a reaction of a reactant, is composed of a top plate 2 which is the metal substrate and a base plate 3, wherein an R2O3 film (Y2O3 film) which is an oxide having a crystal structure of a rare earth element R is formed as an insulation film 31 between the base plate 3 and the thin film heater 32 provided in the surface of the base plate. COPYRIGHT : (C)2008, JPO&INPIT


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