| 申请日期 | 2026-01-13 | 申请号 | EP07015109 |
| 公开（公告）号 | EP1898457A1 | 公开（公告）日 | 2008-03-12 |
| 公开国别 | EP | 申请人省市代码 | 全国 |
| 申请人 | Applied Materials Inc | ||
| 简介 | Embodiments of the present invention provide a substrate support assembly (148) having a protective layer (136) that enhances plasma resistance. In one embodiment, a substrate support assembly includes an electrostatic chuck (150) having an upper substrate support surface, and a protective layer disposed on the electrostatic chuck, wherein the protective layer is fabricated by a ceramic material containing a rare earth metal. | ||
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