| 申请日期 | 2025-07-05 | 申请号 | JP2006512389 |
| 公开（公告）号 | JPWO2005100641A1 | 公开（公告）日 | 2008-03-06 |
| 公开国别 | JP | 申请人省市代码 | 全国 |
| 申请人 | Advanced Energy Industries Inc | ||
| 简介 | A simple and low cost method for imparting excellent hydrogen resistance to various types of articles such as a rare earth metal-based permanent magnet. A method for imparting hydrogen resistance to an article of the present invention is characterized by forming a metal coating film by pulse plating on the surface of the article. | ||
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