| 简介 |
PROBLEM TO BE SOLVED : To provide a method for manufacturing a thin film of a crystallized metal oxide, namely, a high-performance phosphor thin-film material, by which the thin film containing crystallized Y2O3 can be deposited on a glass or silicon substrate.
SOLUTION : The method for manufacturing the thin film of the crystallized metal oxide comprises a step of crystallizing an organometallic thin film or metal oxide film, which is deposited on the substrate and contains at least one rare earth metal element selected from the group consisting of Y, Dy, Sm, Gd, Ho, Eu, Tm, Tb, Er, Ce, Pr, Yb, La, Nd and Lu, while keeping the temperature of the organometallic thin film or metal oxide film at 250-600°C and while irradiating the organometallic thin film or metal oxide film with ultraviolet light having ≤200 nm wavelength.
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