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SUBSTRATE SUPPORT WITH PROTECTIVE LAYER FOR PLASMA RESISTANCE 发明申请

2023-12-17 4440 338K 0

专利信息

申请日期 2025-06-27 申请号 KR1020070076901
公开(公告)号 KR1020080012217A 公开(公告)日 2008-02-11
公开国别 KR 申请人省市代码 全国
申请人 APPLIED MATERIALS INC
简介 PURPOSE : A substrate support body with a protection layer for plasma resistance is provided to form a surface resistive to strong corrosion and plasma on a substrate support assembly by supplying a substrate support assembly having a protection layer for intensifying plasma resistivity. CONSTITUTION : An electrostatic chuck(150) has an upper substrate supporting surface. A protection layer(136) is disposed on the electrostatic chuck. The protection layer is a ceramic material containing rare earth metal. The rare earth metal includes at least one of Sc or Ce. The protection layer includes Y2O3 mixed in metal that is at least one of Al, Mg, Ti and Ta. © KIPO 2008


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