| 申请日期 | 2026-01-14 | 申请号 | US11461643 |
| 公开（公告）号 | US20080029032A1 | 公开（公告）日 | 2008-02-07 |
| 公开国别 | US | 申请人省市代码 | 全国 |
| 申请人 | SUN JENNIFER Y; CHOU IRENE A | ||
| 简介 | Embodiments of the present invention provide a substrate support assembly having a protective layer that enhances plasma resistance. In one embodiment, a substrate support assembly includes an electrostatic chuck having an upper substrate support surface, and a protective layer disposed on the electrostatic chuck, wherein the protective layer is fabricated by a ceramic material containing a rare earth metal. | ||
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