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LASER ANTI-SPATTER SLURRY OF RARE EARTH OXIDES 发明申请

2023-06-10 4180 482K 0

专利信息

申请日期 2026-04-24 申请号 US15668151
公开(公告)号 US20190039186A1 公开(公告)日 2019-02-07
公开国别 US 申请人省市代码 全国
申请人 General Electric Company
简介 Methods for forming a hole in a coated component are provided. The method may include forming a sacrificial layer over a ceramic barrier coating of a substrate, drilling a hole into the coated component such that any spatter formed during drilling deposits onto the sacrificial layer, and removing the sacrificial layer along with the spatter deposited thereon. The sacrificial layer may include a rare earth oxide (e.g., rare earth oxide particles). Intermediate ceramic matrix composite (CMC) component are also provided. The intermediate CMC may include a CMC body, an environmental barrier coating on the bond coating, and a sacrificial layer on the environmental barrier coating, with the sacrificial layer including particles of a rare earth oxide dispersed in a polymeric matrix.


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