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A manufacturing method of a group III nitride single crystal elements and device using the same 发明授权

2023-12-10 3510 152K 0

专利信息

申请日期 2025-08-17 申请号 JP2005503673
公开(公告)号 JP4030125B2 公开(公告)日 2008-01-09
公开国别 JP 申请人省市代码 全国
申请人 Foundation Osaka Industrial Promotion Organization801000061
简介 A production method is provided in which Group-III-element nitride single crystals that have a lower dislocation density and a uniform thickness and are transparent, high quality, large, and bulk crystals can be produced with a high yield. The method for producing Group-III-element nitride single crystals includes : heating a reaction vessel containing at least one metal element selected from the group consisting of an alkali metal and an alkaline-earth metal and at least one Group III element selected from the group consisting of gallium (Ga), aluminum (Al), and indium (In) to prepare a flux of the metal element; and


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