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ELECTRON LENS AND CHARGED PARTICLE BEAM DEVICE USING IT 发明申请

2023-04-23 2370 336K 0

专利信息

申请日期 2025-06-30 申请号 JP2006137815
公开(公告)号 JP2007311117A 公开(公告)日 2007-11-29
公开国别 JP 申请人省市代码 全国
申请人 HITACHI HIGH TECH CORP
简介 PROBLEM TO BE SOLVED : To provide an electron lens with small size and low aberration and a charged particle beam device such as an ultra-small, high resolution SEM or the like using the same. SOLUTION : The electron lens has an upper magnetic pole 2 and a test piece side magnetic pole 3 connected magnetically to the respective pole of a permanent magnet 1 made of a high strength magnetic material such as a rare earth cobalt system and a neodymium iron boron system and having a structure of axial symmetry with a hole in the center, and a magnetic lens is formed on the axis by installing an inner gap 100 on the center axis side. Further, the outside magnetic field is partially shielded and a semi-fixing type magnetic path 4 to adjust a magnetic resistance value is installed at the outside, and the space between the test piece side magnetic pole 3 and the magnetic path 4 forms a region with highest magnetic resistance in the region outside of the permanent magnet 1. Further, the space between the permanent magnet 1 and the upper magnetic pole 2, the test piece side magnetic pole 3, and the semi fixing type magnetic path 4 is filled with a filler of a non-magnetic material to forme an objective lens. COPYRIGHT : (C)2008, JPO&INPIT


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