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REFLECTING FILM EXCELLENT IN COHESION RESISTANCE AND SULFUR RESISTANCE 发明申请

2023-07-03 1040 556K 0

专利信息

申请日期 2025-07-11 申请号 US11962942
公开(公告)号 US20080171196A1 公开(公告)日 2008-07-17
公开国别 US 申请人省市代码 全国
申请人 Toshiki Sato; Jun Suzuki; Shinichi Tanifuji; Takayuki Tsubota; Yoshinori Ito
简介 Disclosed is a reflecting film comprising : an Ag or Ag-base alloy thin film of an Ag-base alloy containing at least one element among Au, Pt, Pd, Bi, and rare-earth elements as a first layer; a film of an oxide or oxynitride of at least one element among Si, Al and Ti having a thickness between 5 and 50 nm as a second layer deposited on the first layer; and a film having a thickness between 10 and 100 nm formed by a plasma polymerization process as a third layer deposited on the second layer.


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