| 简介 |
PROBLEM TO BE SOLVED : To provide : a wiring film for a flat panel display, which is arranged to be able to suppress the rise in wiring resistance even if going through a heat hysteresis at a high temperature of 400°C or higher and 500°C or lower, which does not cause a hillock and the like, and which is superior in heat resistance; and a sputtering target to be used for forming the wiring film.
SOLUTION : A wiring film for a flat panel display according to the present invention is one to be formed on a substrate. The wiring film comprises a laminate structure in which first and second layers are laminated. The first layer includes at least one high-melting point metal selected from a group consisting of Mo, Ti, Cr, W and Ta; the second layer is made of an Al alloy including a rare earth element and Ni, whose contents are each 0.01 atom% or more; and the total content of the rare earth element and Ni is 0.055 atom% or less.
SELECTED DRAWING : Figure 8
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