| 简介 |
PROBLEM TO BE SOLVED : To provide a method for producing a substrate, by which a polishing agent can be removed from the surface of a substrate by cleaning using a chemical solution after a precision polishing process and the substrate having a surface with an extremely high smoothness as required in an EUV lithography technology or the like in recent years after cleaning can be produced.
SOLUTION : The method for producing the substrate includes, after polishing the surface of a substrate made of glass or a glass ceramic so that the surface roughness RMS is ≤1.0 nm, a cleaning process for cleaning the surface of the substrate by using a solution containing at least one kind of acid selected from sulfuric acid, nitric acid, and hydrochloric acid so that the absolute value of the variation of the surface roughness RMS of the substrate before and after cleaning is ≤0.5 nm. In the method, a solution capable of dissolving 0.001g of a rare earth oxide within 30 min with 200g thereof is used as the solution.
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