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Oxide semiconductor, thin film transistor including the same and method of manufacturing a thin fil 发明申请

2023-01-27 3150 653K 0

专利信息

申请日期 2025-06-27 申请号 US12078706
公开(公告)号 US20090008638A1 公开(公告)日 2009-01-08
公开国别 US 申请人省市代码 全国
申请人 Dong hun Kang; I hun Song; Young soo Park; Chang jung Kim; Eun ha Lee; Jae cheol Lee
简介 Example embodiments relate to an oxide semiconductor including zinc oxide (ZnO), a thin film transistor including a channel formed of the oxide semiconductor and a method of manufacturing the thin film transistor. The oxide semiconductor may include a GaxInyZnz oxide and at least one material selected from the group consisting of a 4A group element, a 4A group oxide, a rare earth element and combinations thereof.


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