| 简介 |
A method of seasoning a film-forming apparatus in which a silicon nitride film is formed on a base placed in a treatment vessel. The method is conducted for diminishing particles in the apparatus. The method comprises subjecting the treatment vessel to plasma cleaning to remove a film deposited on the inner wall thereof (step S1), subsequently depositing an amorphous silicon film (step S2), depositing thereon a silicon nitride film in which the nitrogen content gradually increases in the thickness direction (step S3), and keeping the inside of the treatment vessel being filled with a rare-gas plasma until film formation on the base is initiated (step S4).© KIPO & WIPO 2009 |
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