| 申请日期 | 2025-11-26 | 申请号 | US15411892 |
| 公开（公告）号 | US10186400B2 | 公开（公告）日 | 2019-01-22 |
| 公开国别 | US | 申请人省市代码 | 全国 |
| 申请人 | Applied Materials Inc | ||
| 简介 | Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The plasma resistant coating has a stress relief layer and a rare earth metal-containing oxide layer and uniformly covers features, such as those having an aspect ratio of about 3 : 1 to about 300 : 1. | ||
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