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R-T-B BASED PERMANENT MAGNET 发明申请

2023-02-20 3310 76K 0

专利信息

申请日期 2025-07-03 申请号 JP2008176214
公开(公告)号 JP2008235948A 公开(公告)日 2008-10-02
公开国别 JP 申请人省市代码 全国
申请人 TDK CORP
简介 PROBLEM TO BE SOLVED : To provide an R-T-B based permanent based magnet easily applicable to the actual manufacture of an R-T-B based permanent based magnet, and having an effective plating film to secure a hardness. SOLUTION : The R-T-B based permanent based magnet 1 has a magnet element 2 composed of a sintered compact including at least a main-phase crystal grain comprising an R2T14B compound, and an intergranular phase containing more R than in the main-phase crystal grain; and a plating film 3 formed by an electrolytic Cu plating method for coating the surface of the magnetic element 2, and satisfied with the following inequality 0.005


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