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MINUS ION PRODUCING SOURCE AND METHOD USING FLUID KINETIC AND THERMAL ENERGIES 发明申请

2023-03-02 2850 1454K 0

专利信息

申请日期 2025-07-07 申请号 WOJP08053264
公开(公告)号 WO2008108216A1 公开(公告)日 2008-09-12
公开国别 WO 申请人省市代码 全国
申请人 INCREMENT CO LTD; HATANAKA Hiromi; ARIJI Kazuhiko
简介 [PROBLEMS] Conventional minus ion producing apparatus involves a problem that minus ions cannot be produced without voltage or light application energy because the minus ion producing methods are kinetic energy applying method such as a method for applying a high voltage or a method for applying ultraviolet ray or radiation to a photoelectron material. [MEANS FOR SOLVING PROBLEMS] A minus ion producing source and method for producing minus ions by forming a coating film comprising a ferroelectric material and an additive for assisting and enhancing the action of the ferroelectric material or an additive for solidifying a constituent material containing the ferroelectric material on the surface of a conductive base having a projection/recess shape, connecting the conductive base to the earth or an antenna, continuously producing negative charge by electrical polarization caused in crystals of the ferromagnetic material placed in the coating film because of a variation of the input amount of kinetic and thermal energies of the object fluid, concentrating the minus ions on the surface of the coating film, and thereby giving electrons to the object fluid in contact with the surface of the coating film.


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