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METHOD OF MANUFACTURING INSULATION FILM, REACTOR, POWER GENERATION EQUIPMENT, AND ELECTRONIC EQUI 发明申请

2023-08-02 1720 304K 0

专利信息

申请日期 2025-07-08 申请号 JP2008310560
公开(公告)号 JP2009102738A 公开(公告)日 2009-05-14
公开国别 JP 申请人省市代码 全国
申请人 CASIO COMPUTER CO LTD
简介 PROBLEM TO BE SOLVED : To provide a method of manufacturing an insulation film having enhanced dielectric strength, a reactor, a power generation equipment and an electronic equipment. SOLUTION : A micro reactor 1 for causing reaction of a reactant is constituted by a top plate 2, a bottom plate 3 and the like being metal substrates, wherein an R2O3 film (e.g.Y2O3 film) having crystal structure of a rare-earth element R is formed as an insulation film 31 between the bottom plate 3 and a thin film heater 32 provided on the surface of the bottom plate 3. The R2O3 film is formed by, after forming the R film on the surface of the bottom plate 3, forming an RH2 film by hydrogenating the R film and further oxidizing it. COPYRIGHT : (C)2009, JPO&INPIT


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