| 简介 |
PURPOSE : An etch-resistant heater is provided to extend the lifetime of an etch-resistant heater by reducing the danger of deterioration and disassembly and by including excellent etch resistance.
CONSTITUTION : A base substrate includes graphite; refractory metal, transition metal, rare-earth metal and alloy thereof; a sintered material including at least one of an oxide, a nitride, a carbide, a nitride carbide and an oxynitride of an element selected from a group of B, Al, Si, Ga, refractory hard metal and transition metal; an oxide or an oxynitride of aluminum; and one of the mixture thereof. The base substrate is coated with an over-coating layer(9) having higher heat conductivity than 100 W/m°K. The base substrate is included in an apparatus for use in a wafer process chamber. The apparatus can be a susceptor, and the base substrate can include graphite. The over-coating layer can include thermal decomposition graphite.
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