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The cerium oxide abrasive material, its manufacture and use 发明授权

2023-03-27 1190 58K 0

专利信息

申请日期 2025-06-27 申请号 JP2006544162
公开(公告)号 JP3929481B2 公开(公告)日 2007-06-13
公开国别 JP 申请人省市代码 全国
申请人 HITACHI LTD
简介 The present invention provides a cerium oxide-based abrasive ensuring high removal rate, less generation of scratches, high-precision polished surface with small surface roughness, and a safe, simple and low-cost production process. Further, the present invention provides a method for producing such an abrasive. The method of the present invention comprises (a) adding a precipitant to an aqueous cerium-containing light rare-earth salt solution to precipitate a light rare-earth salt, thereby obtaining a first slurry containing a light rare-earth salt particle; (b) adding a fluorinating agent to a slurry containing a light rare-earth salt particle to react the light rare-earth salt with the fluorinating agent, thereby obtaining a second slurry containing a light rare-earth fluoride particle; (c) mixing the first slurry and the second slurry to obtain a mixed slurry; and (d) drying and firing the mixed slurry, and a cerium oxide-based abrasive obtained by this method. The abrasive of the present invention is produced by the method of the present invention.


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