| 简介 |
PROBLEM TO BE SOLVED : To provide a substrate having a mark whose position measurement accuracy is not deteriorated by the interference of a radiation reflected by the mark with the radiation returned to the mark after passing through a transparent layer and reflected on the surface of the substrate, when exposing the substrate having the transparent process layer with a mask in a lithography projection device at the time of irradiating a lineup mark provided in the transparent layer for arranging the substrate with lineup beam of the radiation. SOLUTION : Lineup marks P1and P2in the transparent process layer of the substrate W include a region 3 of high reflection factor for reflecting the radiation of the lineup beam and region 1 of low reflection factor reflecting little radiation, and scattering structure 5 for scattering radiation of the lineup beam into the low reflection factor region and absorbing. Accordingly, it is rare that the lineup system is disturbed by the interference. COPYRIGHT : (C)2007, JPO&INPIT |
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