客服热线:18202992950

RECTANGULAR SEMICONDUCTOR SUPPORT FOR MICROELECTRONICS AND METHOD FOR MAKING SAME 发明授权

2023-09-06 1810 164K 0

专利信息

申请日期 2026-03-03 申请号 FR04012699
公开(公告)号 FR2878648B1 公开(公告)日 2007-02-02
公开国别 FR 申请人省市代码 全国
申请人 COMMISSARIAT ENERGIE ATOMIQUE
简介 The support (1) consists of a rectangular substrate (5) of graphite with front (6) and rear (7) faces, and at least one front face stack comprising a layer of monocrystalline diamond (8a), a layer of an electrically insulating oxide (9a) and a semiconducting layer (2a). A second stack of the same materials (8b, 9b, 2b) and an optional layer of a polymer material can be applied to the rear face of the substrate. The oxide layer contains at least one of the following : Al2O3, BaSrTiO3. HfO2 and rare earth oxides. The support is also fitted with electrical (3) and thermal (11) connections.


您还没有登录,请登录后查看下载地址


反对 0举报 0 收藏 0 打赏 0评论 0
下载排行
网站首页  |  关于我们  |  联系方式  |  使用协议  |  版权隐私  |  网站地图  |  排名推广  |  广告服务  |  积分换礼  |  网站留言  |  RSS订阅  |  违规举报  |  京ICP备2021025988号-4