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SEMICONDUCTOR ON INSULATOR SUBSTRATE AND DEVICE FORMED THEREFROM 发明申请

2023-02-01 3610 388K 0

专利信息

申请日期 2025-06-24 申请号 KR1020067023279
公开(公告)号 KR1020070012458A 公开(公告)日 2007-01-25
公开国别 KR 申请人省市代码 全国
申请人 ADVANCED MICRO DEVICES INC
简介 A semiconductor on insulator (SOI) device is comprised of a layer of a dielectric material (52) having a perovskite lattice, such as a rare earth scandate. The dielectric material (52) is selected to have an effective lattice constant that enables growth of semiconductor material (54) having a diamond lattice directly on the dielectric (52). Examples of the rare earth scandate dielectric include gadolinium scandate (GdScO3), dysprosium scandate (DyScO3), and alloys of gadolinium and dysprosium scandate (Gd1-XDyXSc03). © KIPO & WIPO 2007


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