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For polishing glass material composition 发明授权

2023-09-18 4960 59K 0

专利信息

申请日期 2025-07-18 申请号 JP08357205
公开(公告)号 JP3856513B2 公开(公告)日 2006-12-13
公开国别 JP 申请人省市代码 全国
申请人 Showa Denko KK2004
简介 PROBLEM TO BE SOLVED : To obtain the subject composition capable of maintaining a high grinding speed for a long period without any fear of causing surface defects such as pits in a material to be worked by compounding an abrasive with an amino acid and an amine. SOLUTION : This abrasive composition comprises (A) an abrasive consisting essentially of a rare earth oxide mixture containing cerium oxide, (B) an amino acid and (C) an amine which is preferably at least one compound selected from melamine and hydrazine or its salt, ethylenediamines and ethanolamine. A bastnaesite-based abrasive having about 50wt.% cerium oxide content is preferably used as the above abrasive. The content of the component B is preferably 0.3-3.0wt.% and that of the component C is preferably 0.3-3.0wt.%.


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