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SPUTTERING TARGET MADE FROM ALLOY COMPOSED OF Al, Ni AND RARE EARTH ELEMENT 发明申请

2023-11-27 2440 569K 0

专利信息

申请日期 2025-06-26 申请号 JP2005037937
公开(公告)号 JP2006225687A 公开(公告)日 2006-08-31
公开国别 JP 申请人省市代码 全国
申请人 KOBE STEEL LTD; KOBELCO KAKEN KK
简介 PROBLEM TO BE SOLVED : To provide a sputtering target made from an alloy composed of Al, Ni and a rare earth element, which causes little warpage (deformation) when produced and while being used, can be precisely and efficiently produced, and can lead to a stable film-forming operation. SOLUTION : The sputtering target made from the alloy composed of Al, Ni and a rare earth element is a sputtering target made from an Al-based alloy containing Ni and a rare earth element; and includes chemical compounds having an aspect ratio of 2.5 or higher and a circle equivalent diameter of 0.2 μm or larger in an amount of 5.0×104/mm2 or more when a cross section perpendicular to a target plane is observed at a magnification of 2, 000 times or higher. COPYRIGHT : (C)2006, JPO&NCIPI


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