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TARGET FOR X-RAY GENERATION AND ITS MANUFACTURING METHOD 发明申请

2023-04-20 2040 60K 0

专利信息

申请日期 2025-09-12 申请号 JP2005027119
公开(公告)号 JP2006216340A 公开(公告)日 2006-08-17
公开国别 JP 申请人省市代码 全国
申请人 HITACHI SHIPBUILDING ENG CO
简介 PROBLEM TO BE SOLVED : To provide a target for X-ray generation capable of preventing its crack or peel-off, by alleviating stress such as tensile stress generated on its surface or shearing stress generated at its joint part with a base stand. SOLUTION : A target member 4 composed of rare-earth metal is jointed to a base stand 2 constituted of copper with higher thermal conductivity than a component material of the target member 4 with the use of a brazing material 3 made by adding titanium to silver, with a ratio of a thickness t2 of the base stand 2 to a thickness t1 of the target member 4 within the range of 0.1 to 0.6. COPYRIGHT : (C)2006, JPO&NCIPI


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